February 10, 2006
Uniform and selective CVD growth of carbon nanotubes and nanofibers on arbitrarily microstructured silicon surfaces
A.J. Hart, B.O. Boskovic, A.T.H. Chuang, V.B. Golovko, J. Robertson, B.F.G. Johnson, A.H. Slocum. Nanotechnology 17:1397-1403, 2006.
Carbon nanotubes (CNTs) and nanofibres (CNFs) are grown on bulk-micromachined silicon surfaces by thermal and plasma-enhanced chemical vapour deposition (PECVD), with catalyst deposition by electron beam evaporation or from a colloidal solution of cobalt nanoparticles. Growth on the peaked topography of plasma-etched silicon 'micrograss' supports, as well as on sidewalls of vertical structures fabricated by deep-reactive ion etching demonstrates the performance of thermal CVD and PECVD in limiting cases of surface topography. In thermal CVD, uniform films of tangled single-walled CNTs (SWNTs) coat the structures despite oblique-angle...